POLYAMIC ACID RESIN COMPOSITION

Details for Australian Patent Application No. 2002318550 (hide)

Owner NISSAN CHEMICAL INDUSTRIES, LTD.

Inventors SAHADE, Daniel, Antonio; NIHIRA, Takayasu; HATANAKA, Tadashi

Pub. Number AU-A-2002318550

PCT Number PCT/JP02/07178

PCT Pub. Number WO2003/011974

Priority 2001-225817 26.07.01 JP

Filing date 15 July 2002

Wipo publication date 17 February 2003

International Classifications

C08L 079/08 Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing nitrogen with or without oxygen, or carbon only, not provided for in groups

G03F 007/038 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are rendered insoluble or differentially wettable

G02B 005/20 Optical elements other than lenses - Filters

G09F 009/30 Indicating arrangements for variable information in which the information is built-up on a support by selection or combination of individual elements - in which the desired character or characters are formed by combining individual elements

H05B 033/14 Electroluminescent light sources - characterised by the chemical or physical composition or the arrangement of the electroluminescent material

H05B 033/12 Electroluminescent light sources - Light sources with substantially two-dimensional radiating surfaces

H05B 033/22 Electroluminescent light sources - characterised by the chemical or physical composition or the arrangement of auxiliary dielectric or reflective layers

Event Publications

9 January 2003 Complete Application Filed

  Priority application(s): 2001-225817 26.07.01 JP

29 May 2003 Application Open to Public Inspection

  Published as AU-A-2002318550

8 April 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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