LOW METALLIC IMPURITY SIO BASED THIN FILM DIELECTRICS ON SEMICONDUCTOR SUBSTRATES USING A ROOM TEMPERATURE WET CHEMICAL GROWTH PROCESS, METHOD AND APPLICATIONS THEREOF

Details for Australian Patent Application No. 2002318413 (hide)

Owner NANODIELECTRICS CORPORATION

Inventors FAUR, Horia, M.; FAUR, Mircea; FAUR, Maria

Pub. Number AU-A-2002318413

PCT Number PCT/US02/20145

PCT Pub. Number WO2003/003438

Priority 09/892,191 26.06.01 US

Filing date 26 June 2002

Wipo publication date 3 March 2003

International Classifications

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

9 January 2003 Complete Application Filed

  Priority application(s): 09/892,191 26.06.01 US

15 May 2003 Application Open to Public Inspection

  Published as AU-A-2002318413

11 March 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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