SPUTTERING TARGET, TRANSPARENT CONDUCTIVE FILM, AND THEIR MANUFACTURING METHOD

Details for Australian Patent Application No. 2002315800 (hide)

Owner IDEMITSU KOSAN CO., LTD.

Inventors INOUE, Kazuyoshi; MATSUZAKI, Shigeo

Pub. Number AU-A-2002315800

PCT Number PCT/JP02/06888

PCT Pub. Number WO2003/014409

Priority 2001-235022 02.08.01 JP; 2001-296089 27.09.01 JP; 2001-297159 27.09.01 JP

Filing date 8 July 2002

Wipo publication date 24 February 2003

International Classifications

C23C 014/08 Coating by vacuum evaporation, by sputtering or by ion implantation - Oxides

C23C 014/34 Coating by vacuum evaporation, by sputtering or by ion implantation - Sputtering

H01B 005/14 - comprising conductive layers or films on insulating-supports

Event Publications

2 January 2003 Complete Application Filed

  Priority application(s): 2001-235022 02.08.01 JP; 2001-296089 27.09.01 JP; 2001-297159 27.09.01 JP

19 June 2003 Application Open to Public Inspection

  Published as AU-A-2002315800

6 May 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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