MICROWAVE PLASMA PROCESSING DEVICE, PLASMA PROCESSING METHOD, AND MICROWAVE RADIATING MEMBER

Details for Australian Patent Application No. 2002313241 (hide)

Owner TOKYO ELECTRON LIMITED OHMI, Tadahiro

Inventors GOTO, Tetsuya; HIRAYAMA, Masaki; OHMI, Tadahiro

Pub. Number AU-A-2002313241

PCT Number PCT/JP02/06110

PCT Pub. Number WO2003/001578

Priority 2001-186915 20.06.01 JP

Filing date 19 June 2002

Wipo publication date 8 January 2003

International Classifications

C23C 016/511 Chemical deposition or plating by decomposition

H05H 001/46 Generating plasma - using applied electromagnetic fields, e.g. high frequency or microwave energy

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

2 January 2003 Complete Application Filed

  Priority application(s): 2001-186915 20.06.01 JP

19 June 2003 Application Open to Public Inspection

  Published as AU-A-2002313241

11 March 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

Legal

The information provided by the Site not in the nature of legal or other professional advice. The information provided by the Site is derived from third parties and may contain errors. You must make your own enquiries and seek independent advice from the relevant industry professionals before acting or relying on any information contained herein. Check the above data against the Australian Patent Office AUSPAT database.

Next and Previous Patents/Applications

2002313242-Tissue-specific transporter inhibitor

2002313240-WALL STRUCTURE OF BASE ISOLATION STRUCTURE