PROJECTION OPTICAL SYSTEM, EXPOSURE SYSTEM AND METHOD

Details for Australian Patent Application No. 2002313201 (hide)

Owner NIKON CORPORATION

Inventors OZAWA, Toshihiko; NIISAKA, Shunsuke; OMURA, Yasuhiro; SHIRAISHI, Naomasa; TANAKA, Issei; OWA, Soichi

Pub. Number AU-A-2002313201

PCT Number PCT/JP02/05878

PCT Pub. Number WO2003/003429

Priority 2001-196123 28.06.01 JP; 2001-243320 10.08.01 JP

Filing date 12 June 2002

Wipo publication date 3 March 2003

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

G02B 001/02 Optical elements characterised by the material of which they are made

G02B 017/08 Systems with reflecting surfaces, with or without refracting elements - Catadioptric systems

G02B 013/24 Optical objectives specially designed for the purposes specified below - for reproducing or copying at short object distances

Event Publications

2 January 2003 Complete Application Filed

  Priority application(s): 2001-196123 28.06.01 JP; 2001-243320 10.08.01 JP

15 May 2003 Application Open to Public Inspection

  Published as AU-A-2002313201

18 March 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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