EXPOSURE DEVICE, DEVICE MANUFACTURING METHOD, AND TEMPERATURE STABILIZATION FLOW PASSAGE DEVICE

Details for Australian Patent Application No. 2002313190 (hide)

Owner NIKON CORPORATION

Inventors KATO, Yuzo

Pub. Number AU-A-2002313190

PCT Number PCT/JP02/05763

PCT Pub. Number WO2002/101804

Priority 2001-176149 11.06.01 JP

Filing date 11 June 2002

Wipo publication date 23 December 2002

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

2 January 2003 Complete Application Filed

  Priority application(s): 2001-176149 11.06.01 JP

15 May 2003 Application Open to Public Inspection

  Published as AU-A-2002313190

11 March 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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