HIGH-PURITY FLUORINE GAS, PRODUCTION AND USE THEREOF, AND METHOD FOR ANALYZING TRACE IMPURITIES IN HIGH-PURITY FLUORINE GAS

Details for Australian Patent Application No. 2002311629 (hide)

Owner SHOWA DENKO K. K.

Inventors TORISU, Junichi; ATOBE, Hitoshi; HOSHINO, Yasuyuki

Pub. Number AU-A-2002311629

PCT Number PCT/JP02/06519

PCT Pub. Number WO2003/002454

Priority 2001-199437 29.06.01 JP; 2001-199731 29.06.01 JP; 60/306,421 20.07.01 US; 60/306,422 20.07.01 US

Filing date 27 June 2002

Wipo publication date 3 March 2003

International Classifications

C01B 007/20 Halogens

C01G 053/08 Compounds of nickel

G01N 030/14 Investigating or analysing materials by separation into components using adsorption, absorption or similar phenomena or using ion-exchange, e.g. chromatography

G01N 021/35 Investigating or analysing materials by the use of optical means, i.e. using infra-red, visible, or ultra-violet light

H01S 003/225 Lasers, i.e. devices for generation, amplification, modulation, demodulation, or frequency-changing, using stimulated emission, of infra-red, visible, or ultra-violet waves

Event Publications

2 January 2003 Complete Application Filed

  Priority application(s): 2001-199437 29.06.01 JP; 2001-199731 29.06.01 JP; 60/306,421 20.07.01 US; 60/306,422 20.07.01 US

15 May 2003 Application Open to Public Inspection

  Published as AU-A-2002311629

18 March 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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