LOW METAL POROUS SILICA DIELECTRIC FOR INTEGRAL CIRCUIT APPLICATIONS

Details for Australian Patent Application No. 2002309807 (hide)

Owner HONEYWELL INTERNATIONAL, INC.

Inventors LEUNG, Roger, Y.; DENG, Eric; XIE, Songyuan; LU, Victor, Y.

Pub. Number AU-A-2002309807

PCT Number PCT/US02/15256

PCT Pub. Number WO2003/088344

Filing date 10 April 2002

Wipo publication date 27 October 2003

International Classifications

H01L 021/316 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/312 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C08J 009/26 Working-up of macromolecular substances to porous or cellular articles or materials

C09D 183/04 Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only - Polysiloxanes

C09D 183/02 Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only - Polysilicates

Event Publications

19 December 2002 Complete Application Filed

4 December 2003 Application Open to Public Inspection

  Published as AU-A-2002309807

6 January 2005 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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