Materials, methods, and uses for photochemical generation of acids and/or radical species

Details for Australian Patent Application No. 2002306752 (hide)

Owner The Arizona Board of Regents on behalf of the University of Arizona

Inventors Kuebler, Stephen M.; Cammack, J. Kevin; Perry, Joseph; Zhou, Wenhui; Marder, Seth

Agent Pizzeys

Pub. Number AU-B-2002306752

PCT Number PCT/US02/08227

PCT Pub. Number WO2002/079691

Priority 60/280,672 30.03.01 US

Filing date 1 April 2002

Wipo publication date 15 October 2002

Acceptance publication date 16 October 2008

International Classifications

C07D 295/02 (2006.01) Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms

C07C 211/54 (2006.01) Compounds containing amino groups bound to a carbon skeleton

C07C 381/12 (2006.01) Compounds containing carbon and sulfur and having functional groups not covered by groups

C07D 295/096 (2006.01) Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms

C07D 295/12 (2006.01) Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms

C07D 295/135 (2006.01) Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms

C07D 295/18 (2006.01) Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms

C07D 455/04 (2006.01) Heterocyclic compounds containing quinolizine ring systems, e.g. emetine alkaloids, protoberberine

G03F 7/004 (2006.01) Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

G03F 7/038 (2006.01) Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are rendered insoluble or differentially wettable

G03F 7/20 (2006.01) Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

19 December 2002 Complete Application Filed

  Priority application(s): 60/280,672 30.03.01 US

3 April 2003 Application Open to Public Inspection

  Published as AU-B-2002306752

16 October 2008 Application Accepted

  Published as AU-B-2002306752

12 February 2009 Standard Patent Sealed

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