THICK FILM PHOTORESISTS AND METHODS FOR USE THEREOF

Details for Australian Patent Application No. 2002305511 (hide)

Owner SHIPLEY COMPANY, L.L.C.

Inventors TENG, Gary, Ganghui; THACKERAY, James, W.; MORI, James, M.

Pub. Number AU-A-2002305511

PCT Number PCT/US02/14788

PCT Pub. Number WO2002/093262

Priority 60/290,445 11.05.01 US

Filing date 10 May 2002

Wipo publication date 25 November 2002

International Classifications

G03F 007/00 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces

G03F 007/004 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

G03F 007/26 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Processing photosensitive materials

G03F 007/38 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Treatment before imagewise removal, e.g. prebaking

G03F 007/40 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Treatment after imagewise removal, e.g. baking

Event Publications

19 December 2002 Complete Application Filed

  Priority application(s): 60/290,445 11.05.01 US

1 May 2003 Application Open to Public Inspection

  Published as AU-A-2002305511

4 March 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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