WAFER BASED TEMPERATURE SENSORS FOR CHARACTERIZING CHEMICAL MECHANICAL POLISHING PROCESSES

Details for Australian Patent Application No. 2002305134 (hide)

Owner ADVANCED MICRO DEVICE, INC.

Inventors SINGH, Bhanwar; RANGARAJAN, Bharath; SUBRAMANIAN, Ramkumar; AVANZINO, Steven, C.

Pub. Number AU-A-2002305134

PCT Number PCT/US02/10479

PCT Pub. Number WO2003/024666

Priority 09/955,552 18.09.01 US

Filing date 5 April 2002

Wipo publication date 1 April 2003

International Classifications

B24B 037/04 Lapping machines or devices, i.e. requiring pulverulent abrading substances inserted between a lap of relatively soft but rigid material and the surface to be lapped - designed for working plane surfaces

B24B 049/14 Measuring

Event Publications

19 December 2002 Complete Application Filed

  Priority application(s): 09/955,552 18.09.01 US

5 June 2003 Application Open to Public Inspection

  Published as AU-A-2002305134

10 June 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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