IMPROVED HIGH K-DIELECTRICS USING NICKEL SILICIDE

Details for Australian Patent Application No. 2002303225 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors BESSER, Paul, R.; BUYNOSKI, Matthew, S.; FOSTER, John, Clayton; KING, Paul, L.; PATON, Eric, N.; XIANG, Qi

Pub. Number AU-A-2002303225

PCT Number PCT/US02/10478

PCT Pub. Number WO2003/021662

Priority 09/939,744 28.08.01 US

Filing date 5 April 2002

Wipo publication date 18 March 2003

International Classifications

H01L 021/336 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/28 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 029/51 Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier

H01L 029/49 Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having at least one potential-jump barrier or surface barrier

Event Publications

12 December 2002 Complete Application Filed

  Priority application(s): 09/939,744 28.08.01 US

5 June 2003 Application Open to Public Inspection

  Published as AU-A-2002303225

10 June 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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