METALLOAMIDE AND AMINOSILANE PRECURSORS FOR CVD FORMATION OF DIELECTRIC THIN FILMS

Details for Australian Patent Application No. 2002258624 (hide)

Owner ADVANCED TECHNOLOGY MATERIALS, INC.

Inventors BAUM, Thomas, H.; XU, Chongying; HENDRIX, Bryan, C.; ROEDER, Jeffrey, F.

Pub. Number AU-A-2002258624

PCT Pub. Number WO2002/079211

Priority 09/823,196 30.03.01 US; 09/954,831 18.09.01 US

Filing date 27 March 2002

Wipo publication date 15 October 2002

International Classifications

C07F 007/00 Compounds containing elements of the 4th Group of the Periodic System

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/469 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C07F 007/02 Compounds containing elements of the 4th Group of the Periodic System

C07F 007/10 Compounds containing elements of the 4th Group of the Periodic System

C07F 007/28 Compounds containing elements of the 4th Group of the Periodic System

C23C 008/00 Solid state diffusion into metallic material surfaces

H01L 021/3205 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/4763 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

3 April 2003 Application Open to Public Inspection

  Published as AU-A-2002258624

19 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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