PHOTORESISTS PROCESSABLE UNDER BIOCOMPATIBLE CONDITIONS FOR MULTI-BIOMOLECULE PATTERNING

Details for Australian Patent Application No. 2002258000 (hide)

Owner NATIONAL CENTER FOR SCIENTIFIC RESEARCH "DEMOKRITOS" ARGITIS, Panagiotis MISIAKOS, Konstantinos KAKABAKOS, Sotirios, E. DOUVAS, Antonios DIAKOUMAKOS, Constantinos, D.

Inventors DIAKOUMAKOS, Constantinos, D.; DOUVAS, Antonios; KAKABAKOS, Sotirios, E.; MISIAKOS, Konstantinos; ARGITIS, Panagiotis

Pub. Number AU-A-2002258000

PCT Pub. Number WO2002/097533

Priority 20010100271 31.05.01 GR

Filing date 30 May 2002

Wipo publication date 9 December 2002

International Classifications

G03F 007/40 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Treatment after imagewise removal, e.g. baking

G01N 033/545 Investigating or analysing materials by specific methods not covered by groups

G01N 033/552 Investigating or analysing materials by specific methods not covered by groups

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

Event Publications

8 May 2003 Application Open to Public Inspection

  Published as AU-A-2002258000

11 March 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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