METHOD AND APPARATUS FOR IMPROVED TEMPERATURE CONTROL IN ATOMIC LAYER DEPOSITION

Details for Australian Patent Application No. 2002256973 (hide)

Owner ANGSTRON SYSTEMS, INC.

Inventors CHIANG, Tony, P.; LEESER, Karl, F.

Pub. Number AU-A-2002256973

PCT Pub. Number WO2002/070142

Priority 60/251,795 06.12.00 US; 60/254,280 06.12.00 US; 09/812,285 19.03.01 US; 09/812,352 19.03.01 US; 09/812,486 19.03.01 US; 09/854,092 10.05.01 US

Filing date 9 November 2001

Wipo publication date 19 September 2002

International Classifications

B05B 005/025 Electrostatic spraying apparatus - Discharge apparatus, e.g. electrostatic spray guns

B05C 011/00 Component parts, details or accessories not specifically provided for in groups

B05B 013/00 Machines or plants for applying liquids or other fluent materials to surfaces of objects or other work by spraying, not covered by groups

B05D 001/36 Processes for applying liquids or other fluent materials - Successively applying liquids or other fluent materials, e.g. without intermediate treatment

B05D 003/00 Pretreatment of surfaces to which liquids or other fluent materials are to be applied

B05D 003/02 Pretreatment of surfaces to which liquids or other fluent materials are to be applied - by baking

B05D 003/06 Pretreatment of surfaces to which liquids or other fluent materials are to be applied - by exposure to radiation

C23C 014/00 Coating by vacuum evaporation, by sputtering or by ion implantation

C23C 016/00 Chemical deposition or plating by decomposition

H05H 001/00 Generating plasma

Event Publications

13 March 2003 Application Open to Public Inspection

  Published as AU-A-2002256973

5 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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