METHOD AND EVAPORATING SOLUTION FOR RINSING A DEVELOPED PHOTORESIST LAYER

Details for Australian Patent Application No. 2002255737 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors BABCOCK, Carl, P.

Pub. Number AU-A-2002255737

PCT Pub. Number WO2002/073677

Priority 60/275,852 14.03.01 US; 10/083,873 27.02.02 US

Filing date 14 March 2002

Wipo publication date 24 September 2002

International Classifications

H01L 021/311 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/40 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Treatment after imagewise removal, e.g. baking

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/42 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Stripping or agents therefor

C11D 011/00 Special methods for preparing compositions containing mixtures of detergents

Event Publications

20 March 2003 Application Open to Public Inspection

  Published as AU-A-2002255737

12 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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