NOVEL COPOLYMERS AND PHOTORESIST COMPOSITIONS

Details for Australian Patent Application No. 2002255598 (hide)

Owner SHIPLEY COMPANY, L.L.C.

Inventors BARCLAY, George, G.; KAVANAGH, Robert, J.

Pub. Number AU-A-2002255598

PCT Pub. Number WO2002/069044

Priority 60/271,404 25.02.01 US

Filing date 25 February 2002

Wipo publication date 12 September 2002

International Classifications

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

C08F 020/00 Homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride, ester, amide, imide, or nitrile thereof

Event Publications

6 March 2003 Application Open to Public Inspection

  Published as AU-A-2002255598

12 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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