HIGH RESOLUTION RESISTS FOR NEXT GENERATION LITHOGRAPHIES

Details for Australian Patent Application No. 2002254170 (hide)

Owner UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE UNIVERSITY OF CONNECTICUT GONSALVES, Kenneth, E.

Inventors GONSALVES, Kenneth, E.

Pub. Number AU-A-2002254170

PCT Pub. Number WO2002/073308

Priority 60/274,719 12.03.01 US

Filing date 11 March 2002

Wipo publication date 24 September 2002

International Classifications

G03C 001/725 Photosensitive materials

G03F 007/075 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Silicon-containing compounds

G03F 007/26 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Processing photosensitive materials

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

Event Publications

20 March 2003 Application Open to Public Inspection

  Published as AU-A-2002254170

12 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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