POLYSILOXANE, PROCESS FOR PRODUCTION THEREOF AND RADIATION-SENSITIVE RESIN COMPOSITION

Details for Australian Patent Application No. 2002253665 (hide)

Owner JSR CO., LTD.

Inventors HAYASHI, Akihiro; SHIMOKAWA, Tsutomu; YAMAMOTO, Masafumi; IWASAWA, Haruo

Pub. Number AU-A-2002253665

PCT Pub. Number WO2002/090423

Priority 2001-133795 01.05.01 JP; 2002-48643 25.02.02 JP

Filing date 30 April 2002

Wipo publication date 18 November 2002

International Classifications

C08G 077/24 Macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

C08L 083/08 Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only

G03F 007/075 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Silicon-containing compounds

Event Publications

1 May 2003 Application Open to Public Inspection

  Published as AU-A-2002253665

19 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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