NON-ARSENIC N-TYPE DOPANT IMPLANTATION FOR IMPROVED SOURCE/DRAIN INTERFACES WITH NICKEL SILICIDES

Details for Australian Patent Application No. 2002248181 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors BUYNOSKI, Matthew, S.; XIANG, Qi; BESSER, Paul, R.

Pub. Number AU-A-2002248181

PCT Pub. Number WO2002/067306

Priority 60/268,920 16.02.01 US; 09/813,308 21.03.01 US

Filing date 12 December 2001

Wipo publication date 4 September 2002

International Classifications

H01L 021/285 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

27 February 2003 Application Open to Public Inspection

  Published as AU-A-2002248181

12 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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