DEVICE OR METHOD FOR DEPOSITING ESPECIALLY CRYSTALLINE LAYERS FROM THE GAS PHASE ONTO ESPECIALLY CRYSTALLINE SUBSTRATES

Details for Australian Patent Application No. 2002247656 (hide)

Owner AIXTRON AG

Inventors BECCARD, Rainer; STRAUCH, Gerd; KAPPELER, Johannes; HEUKEN, Michael

Pub. Number AU-A-2002247656

PCT Pub. Number WO2002/083978

Priority 101 18 130.2 11.04.01 DE

Filing date 26 January 2002

Wipo publication date 28 October 2002

International Classifications

C23C 016/30 Chemical deposition or plating by decomposition - Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides

C23C 016/455 Chemical deposition or plating by decomposition - characterised by the method used for introducing gases into the reaction chamber or for modifying gas flows in the reaction chamber

C23C 016/458 Chemical deposition or plating by decomposition - characterised by the method used for supporting substrates in the reaction chamber

Event Publications

17 April 2003 Application Open to Public Inspection

  Published as AU-A-2002247656

19 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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