STEPPER EXPOSURE DOSE CONTROL BASE UPON ACROSS WAFER VARIATIONS IN PHOTORESIST THICKNESS

Details for Australian Patent Application No. 2002247021 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors BODE, Christopher, A.; HEWETT, Joyce, S., Oey; PASADYN, Alexander, J.

Pub. Number AU-A-2002247021

PCT Pub. Number WO2002/063395

Priority 09/776,206 02.02.01 US

Filing date 25 January 2002

Wipo publication date 19 August 2002

International Classifications

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

13 February 2003 Application Open to Public Inspection

  Published as AU-A-2002247021

12 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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