EXPOSURE DEVICE AND SUBSTRATE PROCESSING SYSTEM AND DEVICE PRODUCING METHOD

Details for Australian Patent Application No. 2002246319 (hide)

Owner NIKON CORPORATION

Inventors NISHI, Kenji

Pub. Number AU-A-2002246319

PCT Pub. Number WO2002/084720

Priority 2001-108334 06.04.01 JP

Filing date 3 April 2002

Wipo publication date 28 October 2002

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

17 April 2003 Application Open to Public Inspection

  Published as AU-A-2002246319

19 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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