IN-SITU THICKNESS MEASUREMENT FOR USE IN SEMICONDUCTOR PROCESSING

Details for Australian Patent Application No. 2002241685 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors HALLIYAL, Arvind; PHAN, Khoi, A.; SINGH, Bhanwar

Pub. Number AU-A-2002241685

PCT Pub. Number WO2002/082530

Priority 09/824,112 02.04.01 US

Filing date 19 December 2001

Wipo publication date 21 October 2002

International Classifications

H01L 021/66 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof - Testing or measuring during manufacture or treatment

Event Publications

10 April 2003 Application Open to Public Inspection

  Published as AU-A-2002241685

19 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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