Owner MIYATSU CO., LTD.

Inventors HIRAOKA, Kenzo; MIYATA, Chiharu; TAKAMATSU, Toshiyuki

Pub. Number AU-A-2002241336

PCT Pub. Number WO2003/083915

Filing date 29 March 2002

Wipo publication date 13 October 2003

H01L 021/205 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 016/24 Chemical deposition or plating by decomposition

C23C 014/24 Coating by vacuum evaporation, by sputtering or by ion implantation - Vacuum evaporation

C30B 025/14 Single-crystal growth by chemical reaction of reactive gases, e.g. chemical vapour deposition growth - Feed and outlet means for the gases

H01L 031/04 Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - adapted as conversion devices

H01L 021/203 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 016/44 Chemical deposition or plating by decomposition - characterised by the method of coating