METHOD OF CONTROLLING THE THICKNESS OF LAYERS OF PHOTORESIST

Details for Australian Patent Application No. 2002240098 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors DOSS, Curtis, W.; TOPRAC, Anthony, J.; BUSHMAN, Scott, G.

Pub. Number AU-A-2002240098

PCT Pub. Number WO2002/071152

Priority 09/791,997 23.02.01 US

Filing date 25 January 2002

Wipo publication date 19 September 2002

International Classifications

G03F 007/16 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Coating processes

Event Publications

13 March 2003 Application Open to Public Inspection

  Published as AU-A-2002240098

12 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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