RESIST RELEASING COMPOSITION

Details for Australian Patent Application No. 2002237565 (hide)

Owner NAGASE CHEMTEX CORPORATION

Inventors TAKEI, Mizuki; UCHIDA, Emi; KOTANI, Takeshi

Pub. Number AU-A-2002237565

PCT Pub. Number WO2002/073319

Priority 2001-071031 13.03.01 JP

Filing date 11 March 2002

Wipo publication date 24 September 2002

International Classifications

G03F 007/42 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Stripping or agents therefor

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

20 March 2003 Application Open to Public Inspection

  Published as AU-A-2002237565

12 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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