PLASMA PROCESSING SYSTEM

Details for Australian Patent Application No. 2002237526 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors NAGAYAMA, Nobuyuki; MITSUHASHI, Kouji; NAKAYAMA, Hiroyuki

Pub. Number AU-A-2002237526

PCT Pub. Number WO2002/067311

Priority 2001-47278 22.02.01 JP

Filing date 21 February 2002

Wipo publication date 4 September 2002

International Classifications

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 004/04 Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge - characterised by the coating material

Event Publications

27 February 2003 Application Open to Public Inspection

  Published as AU-A-2002237526

12 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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