EXPOSURE METHOD AND EXPOSURE SYSTEM, AND DEVICE PRODUCTION METHOD

Details for Australian Patent Application No. 2002236305 (hide)

Owner NIKON CORPORATION

Inventors SHIRAISHI, Naomasa

Pub. Number AU-A-2002236305

PCT Pub. Number WO2002/073670

Priority 2001-070273 13.03.01 JP

Filing date 12 March 2002

Wipo publication date 24 September 2002

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G02B 017/08 Systems with reflecting surfaces, with or without refracting elements - Catadioptric systems

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

20 March 2003 Application Open to Public Inspection

  Published as AU-A-2002236305

12 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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