CLEANING METHOD FOR SUBSTRATE TREATMENT DEVICE AND SUBSTRATE TREATMENT DEVICE

Details for Australian Patent Application No. 2002234963 (hide)

Owner TOKYO ELECTRON LIMITED

Inventors OSHIMA, Yasuhiro

Pub. Number AU-A-2002234963

PCT Pub. Number WO2002/073675

Priority 2001-72711 14.03.01 JP

Filing date 5 March 2002

Wipo publication date 24 September 2002

International Classifications

H01L 021/31 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 016/44 Chemical deposition or plating by decomposition - characterised by the method of coating

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

20 March 2003 Application Open to Public Inspection

  Published as AU-A-2002234963

12 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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