HOLDING DEVICE, HOLDING METHOD, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD

Details for Australian Patent Application No. 2002233636 (hide)

Owner NIKON CORPORATION

Inventors MIZUTANI, Hideo; HAGIWARA, Tsuneyuki; YOSHIMOTO, Hiromitsu; HORIKAWA, Hiroto

Pub. Number AU-A-2002233636

PCT Pub. Number WO2002/065519

Priority 2001-36130 13.02.01 JP

Filing date 13 February 2002

Wipo publication date 28 August 2002

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

G03F 001/14 Preparation of originals for the photomechanical production of textured or patterned surfaces - Originals characterised by structural details, e.g. supports, cover layers, pellicle rings

H01L 021/68 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

20 February 2003 Application Open to Public Inspection

  Published as AU-A-2002233636

12 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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