Method for eliminating reaction between photoresist and organosilicate glass

Details for Australian Patent Application No. 2002232816 (hide)

Owner HONEYWELL INTERNATIONAL INC.

Inventors Daniels, Brian, J.; Dunne, Jude, A.; Kennedy, Joseph, T.

Agent Davies Collison Cave

Pub. Number AU-A-2002232816

PCT Pub. Number WO2002/052642

Priority 09/748,692 26.12.00 US

Filing date 20 December 2001

Wipo publication date 8 July 2002

International Classifications

H01L 021/768 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

23 January 2003 Application Open to Public Inspection

  Published as AU-A-2002232816

16 February 2006 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(e). Examination has been requested or an examination report has issued for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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