EXPOSURE SYSTEM, EXPOSURE DEVICE AND DEVICE PRODUCTION METHOD

Details for Australian Patent Application No. 2002232245 (hide)

Owner NIKON CORPORATION

Inventors SHIRAISHI, Naomasa

Pub. Number AU-A-2002232245

PCT Pub. Number WO2002/067303

Priority 2001-41555 19.02.01 JP

Filing date 19 February 2002

Wipo publication date 4 September 2002

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

27 February 2003 Application Open to Public Inspection

  Published as AU-A-2002232245

12 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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