EXPOSURE SYSTEM AND EXPOSURE METHOD, AND DEVICE PRODUCTION METHOD

Details for Australian Patent Application No. 2002230159 (hide)

Owner NIKON CORPORATION

Inventors ISHIKAWA, Jun

Pub. Number AU-A-2002230159

PCT Pub. Number WO2002/063664

Priority 2001-30112 06.02.01 JP

Filing date 6 February 2002

Wipo publication date 19 August 2002

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

13 February 2003 Application Open to Public Inspection

  Published as AU-A-2002230159

12 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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