RESIST COMPOSITION

Details for Australian Patent Application No. 2002228400 (hide)

Owner ASAHI GLASS COMPANY, LIMITED

Inventors KANEKO, Isamu; OKADA, Shinji; KAWAGUCHI, Yasuhide; TAKEBE, Yoko; KODAMA, Shun-ichi

Pub. Number AU-A-2002228400

PCT Pub. Number WO2002/065212

Priority 2001-34023 09.02.01 JP; 2001-219570 19.07.01 JP

Filing date 31 January 2002

Wipo publication date 28 August 2002

International Classifications

G03F 007/039 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

Event Publications

20 February 2003 Application Open to Public Inspection

  Published as AU-A-2002228400

12 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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