ATTENUATED EMBEDDED PHASE SHIFT PHOTOMASK BLANKS

Details for Australian Patent Application No. 2002228202 (hide)

Owner INTERNATIONAL BUSINESS MACHINES CORPORATION

Inventors RACETTE, Kenneth, Christopher; ANGELOPOULOS, Marie; BABICH, Katherina; BROOKS, Cameron, James; CHEY, Jay; GUARNIERI, Richard; HIBBS, Michael, Straight

Pub. Number AU-A-2002228202

PCT Pub. Number WO2002/069037

Priority 09/793,646 26.02.01 US

Filing date 1 February 2002

Wipo publication date 12 September 2002

International Classifications

G03F 001/00 Preparation of originals for the photomechanical production of textured or patterned surfaces

G03F 001/08 Preparation of originals for the photomechanical production of textured or patterned surfaces - Originals having inorganic imaging layers, e.g. chrome masks

Event Publications

6 March 2003 Application Open to Public Inspection

  Published as AU-A-2002228202

12 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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