ATTENUATING PHASE SHIFT MASK FOR PHOTOLITHOGRAPHY

Details for Australian Patent Application No. 2002227363 (hide)

Owner MASSACHUSETTS INSTITUTE OF TECHNOLOGY

Inventors ROTHSCHILD, Mordechai; LIBERMAN, Vladimir

Pub. Number AU-A-2002227363

PCT Pub. Number WO2003/023522

Priority 60/317,694 06.09.01 US; 10/020,047 07.12.01 US

Filing date 10 December 2001

Wipo publication date 24 March 2003

International Classifications

G03F 009/00 Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically

G03C 005/00 Photographic processes or agents therefor

G21K 005/00 Irradiation devices

Event Publications

19 June 2003 Application Open to Public Inspection

  Published as AU-A-2002227363

10 June 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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