FULLERENE COATED COMPONENT OF SEMICONDUCTOR PROCESSING EQUIPMENT

Details for Australian Patent Application No. 2002225711 (hide)

Owner LAM RESEARCH CORPORATION

Inventors O'DONNELL, Robert, J.; CHANG, Christopher, C.; DAUGHERTY, John, E.

Pub. Number AU-A-2002225711

PCT Pub. Number WO2002/053797

Priority 09/749,923 29.12.00 US

Filing date 23 November 2001

Wipo publication date 16 July 2002

International Classifications

C23C 016/02 Chemical deposition or plating by decomposition - Pretreatment of the material to be coated

C23C 016/44 Chemical deposition or plating by decomposition - characterised by the method of coating

C23C 016/26 Chemical deposition or plating by decomposition - Deposition of carbon only

H01L 021/00 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01J 037/32 Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof - Gas-filled discharge tubes

B01J 019/02 Chemical, physical, or physico-chemical processes in general - Apparatus characterised by being constructed of material selected for its chemically-resistant properties

Event Publications

23 January 2003 Application Open to Public Inspection

  Published as AU-A-2002225711

5 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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