Method and device for plasma CVD

Details for Australian Patent Application No. 2002225452 (hide)

Owner Ishikawajima-Harima Heavy Industries Co., Ltd

Inventors ITO, Norikazu

Agent Spruson & Ferguson

Pub. Number AU-B-2002225452

PCT Pub. Number WO2002/058121

Priority 2001-12702 22.01.01 JP

Filing date 21 January 2002

Wipo publication date 30 July 2002

Acceptance publication date 10 August 2006

International Classifications

H01L 21/205 (2006.01) Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

B01J 19/08 (2006.01) Chemical, physical, or physico-chemical processes in general - Processes employing the direct application of electric or wave energy, or particle radiation

C23C 16/509 (2006.01) Chemical deposition or plating by decomposition

H01L 31/04 (2006.01) Semiconductor devices sensitive to infra-red radiation, light, electromagnetic radiation of shorter wavelength, or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation - adapted as conversion devices

H05H 1/46 (2006.01) Generating plasma - using applied electromagnetic fields, e.g. high frequency or microwave energy

Event Publications

13 February 2003 Application Open to Public Inspection

  Published as AU-B-2002225452

10 August 2006 Application Accepted

  Published as AU-B-2002225452

7 December 2006 Standard Patent Sealed

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