PLASMA DEVICE AND PLASMA GENERATING METHOD

Details for Australian Patent Application No. 2002225435 (hide)

Owner TOKYO ELECTRON LIMITED ANDO, Makoto TAKAHASHI, Masaharu

Inventors ANDO, Makoto; ISHII, Nobuo; TAKAHASHI, Masaharu

Pub. Number AU-A-2002225435

PCT Pub. Number WO2002/058441

Priority 2001-10291 18.01.01 JP; 2001-247853 17.08.01 JP

Filing date 18 January 2002

Wipo publication date 30 July 2002

International Classifications

H01L 021/3065 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 016/505 Chemical deposition or plating by decomposition

H01L 021/205 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H05H 001/46 Generating plasma - using applied electromagnetic fields, e.g. high frequency or microwave energy

Event Publications

13 February 2003 Application Open to Public Inspection

  Published as AU-A-2002225435

5 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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