Impact modifier and amorphous polyester resin compositions containing the same

Details for Australian Patent Application No. 2002225400 (hide)

Owner Kaneka Corporation

Inventors Onuma, Hisashi; Kadokura, Mamoru; Kawai, Hideki

Agent Shelston IP

Pub. Number AU-B-2002225400

PCT Pub. Number WO02/55571

Priority 2001007174 16.01.01 JP

Filing date 15 January 2002

Wipo publication date 25 July 2002

Acceptance publication date 12 October 2006

International Classifications

C08F 279/02 (2006.01) Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group

C08F 257/02 (2006.01) Macromolecular compounds obtained by polymerising monomers on to polymers of aromatic monomers as defined in group

C08F 279/04 (2006.01) Macromolecular compounds obtained by polymerising monomers on to polymers of monomers having two or more carbon-to-carbon double bonds as defined in group

C08F 285/00 (2006.01) Macromolecular compounds obtained by polymerising monomers on to preformed graft polymers

C08L 51/04 (2006.01) Compositions of graft polymers in which the grafted component is obtained by reactions only involving carbon-to-carbon unsaturated bonds

C08L 55/02 (2006.01) Compositions of homopolymers or copolymers, obtained by polymerisation reactions only involving carbon-to-carbon unsaturated bonds, not provided for in groups

C08L 67/00 (2006.01) Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain

C08L 67/02 (2006.01) Compositions of polyesters obtained by reactions forming a carboxylic ester link in the main chain

Event Publications

12 August 2004 Application Open to Public Inspection

  Published as AU-B-2002225400

12 October 2006 Application Accepted

  Published as AU-B-2002225400

15 February 2007 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under reg. 22.2I(2). This application has been accepted or advertised accepted. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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