Radiation-sensitive composition changing in refractive index and method of changing refractive index

Details for Australian Patent Application No. 2002222583 (hide)

Owner JSR Corporation

Inventors Shimokawa, Tsutomu; Bessho, Nobuo; Kumano, Atsushi; Nishimura, Isao; Yamada, Kenji

Agent Phillips Ormonde Fitzpatrick

Pub. Number AU-B-2002222583

PCT Pub. Number WO02/48264

Priority 2001-007554 16.01.01 JP; 2001-034028 09.02.01 JP; 2001-029226 06.02.01 JP; 2000-375523 11.12.00 JP

Filing date 6 December 2001

Wipo publication date 24 June 2002

Acceptance publication date 15 June 2006

International Classifications

C08L 101/00 (2006.01) Compositions of unspecified macromolecular compounds

G03F 7/00 (2006.01) Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces

G03F 7/004 (2006.01) Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Photosensitive materials

G03F 7/039 (2006.01) Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Macromolecular compounds which are photodegradable, e.g. positive electron resists

G03F 7/075 (2006.01) Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Silicon-containing compounds

Event Publications

15 June 2006 Application Accepted

  Published as AU-B-2002222583

12 October 2006 Standard Patent Sealed

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