IN-PROCESS WAFER CHARGE MONITOR AND CONTROL SYSTEM FOR ION IMPLANTER

Details for Australian Patent Application No. 2002222267 (hide)

Owner AXCELIS TECHNOLOGIES, INC.

Inventors HALLING, Alfred, Michael

Pub. Number AU-A-2002222267

PCT Pub. Number WO2002/052612

Priority 09/748,735 22.12.00 US

Filing date 18 December 2001

Wipo publication date 8 July 2002

International Classifications

H01J 037/317 Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof - for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation

H01J 037/304 Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof

Event Publications

23 January 2003 Application Open to Public Inspection

  Published as AU-A-2002222267

5 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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