PROCESS FOR REMOVAL OF PHOTORESIST AFTER POST ION IMPLANTATION

Details for Australian Patent Application No. 2002222254 (hide)

Owner AXCELIS TECHNOLOGIES, INC.,

Inventors HALLOCK, John, Scott,; BECKNELL, Alan, Frederick,; SAKTHIVEL, Palani,

Pub. Number AU-A-2002222254

PCT Pub. Number WO2002/052349

Priority 09/742,721 22.12.00 US

Filing date 18 December 2001

Wipo publication date 8 July 2002

International Classifications

G03F 007/42 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Stripping or agents therefor

Event Publications

23 January 2003 Application Open to Public Inspection

  Published as AU-A-2002222254

5 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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