PROJECTION OPTICAL SYSTEM AND PRODUCTION METHOD THEREFOR, EXPOSURE SYSTEM AND PRODUCTION METHOD THEREFOR, AND PRODUCTION METHOD FOR MICRODEVICE

Details for Australian Patent Application No. 2002219528 (hide)

Owner NIKON CORPORATION

Inventors MATSUYAMA, Tomoyuki

Pub. Number AU-A-2002219528

PCT Pub. Number WO2002/054459

Priority 2000-403308 28.12.00 JP; 2001-55754 28.02.01 JP

Filing date 25 December 2001

Wipo publication date 16 July 2002

International Classifications

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

G02B 013/24 Optical objectives specially designed for the purposes specified below - for reproducing or copying at short object distances

G02B 013/18 Optical objectives specially designed for the purposes specified below - with lenses having one or more non-spherical faces, e.g. for reducing geometrical aberration

Event Publications

23 January 2003 Application Open to Public Inspection

  Published as AU-A-2002219528

5 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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