METHOD AND DEVICE FOR MASK CLEANING, AND DEVICE MANUFACTURING SYSTEM

Details for Australian Patent Application No. 2002216381 (hide)

Owner NIKON CORPORATION

Inventors SHIRAISHI, Naomasa

Pub. Number AU-A-2002216381

PCT Pub. Number WO2002/052345

Priority 2000-391688 22.12.00 JP

Filing date 20 December 2001

Wipo publication date 8 July 2002

International Classifications

G03F 001/08 Preparation of originals for the photomechanical production of textured or patterned surfaces - Originals having inorganic imaging layers, e.g. chrome masks

H01L 021/027 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

G03F 001/14 Preparation of originals for the photomechanical production of textured or patterned surfaces - Originals characterised by structural details, e.g. supports, cover layers, pellicle rings

Event Publications

23 January 2003 Application Open to Public Inspection

  Published as AU-A-2002216381

5 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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