METHOD AND APPARATUS FOR IMPROVED ION ACCELERATION IN AN ION IMPLANTATION SYSTEM

Details for Australian Patent Application No. 2002216269 (hide)

Owner AXCELIS TECHNOLOGIES, INC.

Inventors SWENSON, David, D.; SAADATMAND, Kourosh; DIVERGILIO, William, Frank

Pub. Number AU-A-2002216269

PCT Pub. Number WO2002/054443

Priority 60/258,579 28.12.00 US

Filing date 27 December 2001

Wipo publication date 16 July 2002

International Classifications

H01J 037/30 Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof - Electron-beam or ion-beam tubes for localised treatment of objects

H01J 037/317 Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof - for changing properties of the objects or for applying thin layers thereon, e.g. ion implantation

Event Publications

23 January 2003 Application Open to Public Inspection

  Published as AU-A-2002216269

5 February 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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