METHOD FOR RELATING PHOTOLITHOGRAPHY OVERLAY TARGET DAMAGE AND CHEMICAL MECHANICAL PLANARIZATION (CMP) FAULT DETECTION TO CMP TOOL IDENTIFICATION

Details for Australian Patent Application No. 2001292540 (hide)

Owner ADVANCED MICRO DEVICES, INC.

Inventors BODE, Christopher, A.; TOPRAC, Anthony, J.

Pub. Number AU-A-2001292540

PCT Pub. Number WO2002/103776

Filing date 18 June 2001

Wipo publication date 2 January 2003

International Classifications

H01L 021/66 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof - Testing or measuring during manufacture or treatment

G03F 007/20 Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printed surfaces - Exposure

Event Publications

15 May 2003 Application Open to Public Inspection

  Published as AU-A-2001292540

11 March 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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