METHOD AND APPARATUS FOR CLEANING AND METHOD AND APPARATUS FOR ETCHING

Details for Australian Patent Application No. 2001276707 (hide)

Owner L'AIR LIQUIDE, SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE

Inventors SONOBE, Jun; KURODA, Yoshikuni; ZILS, Regis; INO, Minoru; KIMURA, Takako; NISHIKAWA, Yukinobu

Pub. Number AU-A-2001276707

PCT Pub. Number WO2003/012843

Filing date 31 July 2001

Wipo publication date 17 February 2003

International Classifications

H01L 021/205 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/302 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

H01L 021/285 Processes or apparatus specially adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof

C23C 016/44 Chemical deposition or plating by decomposition - characterised by the method of coating

Event Publications

29 May 2003 Application Open to Public Inspection

  Published as AU-A-2001276707

6 May 2004 Application Lapsed, Refused Or Withdrawn, Patent Ceased or Expired

  This application lapsed under section 142(2)(f)/See Reg. 8.3(3). Examination has not yet been requested or directed for this application. Note that applications or patents shown as lapsed or ceased may be restored at a later date.

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